• Dr.
    • Oscar Versolato
    • ARCNL
    • EUV Plasma Processes

Nanolithography

Tin microdroplets play a key role in the continued miniaturization of semiconductor devices. Laser-produced plasmas generated from such microdroplets yield extreme ultraviolet (EUV) light that is used in state-of-the-art nanolithography. In the presentation, the field of EUV nanolithography will be introduced briefly, as well as the role of tin plasmas in it. These plasmas are produced through a series of carefully tailored energetic laser pulses, which inescapably also drive various hydrodynamic instabilities in the formation of stable tin targets.

About

Oscar Versolato received his PhD in 2011 from the University of Groningen, for work on laser spectroscopy on trapped, short-lived radium ions. He did postdoctoral work at the Max-Planck-Institute für Kernphysik in Heidelberg, Germany, on spectroscopy and sympathetic laser cooling of highly charged ions and molecular ions. He has been working on Source research starting 2014 and since 2019 he is a tenured group leader of the EUV Plasma Processes group at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam and an Associate Professor at Vrije Universiteit. His research interests include plasma sources of extreme ultraviolet radiation, droplet deformation and fragmentation after laser pulse impact, highly charged ions, and spectroscopy. He was awarded the 2016 NWO Vidi research grant, and the 2018 ERC Starting and 2022 ERC Consolidator grant. He is the head of the Source Department at ARCNL and is part of the management teams at ARCNL and at Vrije Universiteit.